Absorbers, e.g. opaque materials

Introduced: January 2012

Full Title

Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Absorbers, e.g. opaque materials

Classification Context

Section:: PHYSICS
Class:: PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
Subclass:: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR

2 direct subcodes

Child Classifications

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G03F 1/56 Organic absorbers, e.g. photo-resists
G03F 1/58 having two or more different absorber layers, e.g. stacked multilayer absorbers