by charged particle beam [CPB], e.g. focused ion beam

Full Title

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Preparation processes not covered by groups G03F1/20 - G03F1/50 > Repair or correction of mask defects > by charged particle beam [CPB], e.g. focused ion beam