Preparation processes not covered by groups G03F1/20 - G03F1/50

Full Title

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Preparation processes not covered by groups G03F1/20 - G03F1/50

Child Classifications

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• G03F 1/70 Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
• G03F 1/72 Repair or correction of mask defects
• G03F 1/76 Patterning of masks by imaging
• G03F 1/80 Etching
• G03F 1/82 Auxiliary processes, e.g. cleaning or inspecting