CPC Subgroup
G03F 1/86 by charged particle beam [CPB]
Full Title
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Preparation processes not covered by groups G03F1/20 - G03F1/50 > Auxiliary processes, e.g. cleaning or inspecting > Inspecting > by charged particle beam [CPB]