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CPC Subgroup
G03F 7/0957

Full Title

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K) > Photosensitive materials (G03F7/12, G03F7/14 take precedence) > characterised by structural details, e.g. supports, auxiliary layers (supports for printing plates in general B41N) > having more than one photosensitive layer (G03F7/075 takes precedence)

Top Applicants

Top 10 applicants by patent filingsfor class G03, 2013–2023, worldwide · Source: EPO PATSTAT

  1. CANON JP 19,215
  2. CANON 12,916
  3. ASML NETHERLANDS NL 10,000
  4. FUJIFILM JP 7,814
  5. SAMSUNG ELECTRONICS COMPANY KR 5,181
  6. CARL ZEISS SMT DE 5,079
  7. RICOH COMPANY JP 4,343
  8. LG INNOTEK COMPANY KR 4,054
  9. KYOCERA DOCUMENT SOLUTIONS 3,812
  10. KYOCERA DOCUMENT SOLUTIONS JP 3,682