CPC Subgroup
G03F 7/004 Photosensitive materials (G03F7/12, G03F7/14 take precedence)
Full Title
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K) > Photosensitive materials (G03F7/12, G03F7/14 take precedence)
18 direct subcodes
Child Classifications
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- G03F 7/008 Azides (G03F7/075 takes precedence)
- G03F 7/016 Diazonium salts or compounds (G03F7/075 takes precedence)
- G03F 7/022 Quinonediazides (G03F7/075 takes precedence)
- G03F 7/025 Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds (G03F7/075 takes precedence)
- G03F 7/027 Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F7/075 takes precedence)
- G03F 7/038 Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021)
- G03F 7/039 Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F7/075 takes precedence; macromolecular quinonediazides G03F7/023)
- G03F 7/04 Chromates (G03F7/075 takes precedence)
- G03F 7/06 Silver salts (G03F7/075 takes precedence)
- G03F 7/075 Silicon-containing compounds
- G03F 7/085 Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives (G03F7/075 takes precedence)
- G03F 7/09 characterised by structural details, e.g. supports, auxiliary layers (supports for printing plates in general B41N)