C23C 16/26 Deposition of carbon only
Introduced: January 1985
Full Title
Full titles differ between systems:
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes > characterised by the deposition of inorganic material, other than metallic material > Deposition of carbon only
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes (reactive sputtering or vacuum evaporation C23C14/00) > characterised by the deposition of inorganic material, other than metallic material > Deposition of carbon only
IPC and CPC are identically structured here. All 1 subcodes exist in both systems.
IPC defines codes here since 2000.
Child Classifications
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