characterised by the deposition of inorganic material, other than metallic material

Introduced: January 1985

Full Title

Full titles differ between systems:

IPC:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes > characterised by the deposition of inorganic material, other than metallic material

CPC:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes (reactive sputtering or vacuum evaporation C23C14/00) > characterised by the deposition of inorganic material, other than metallic material

IPC and CPC are identically structured here. All 4 subcodes exist in both systems.

IPC defines codes here since 1985.

Child Classifications

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C23C 16/24 Deposition of silicon only since 1985 IPC+CPC Available in IPC and CPC
C23C 16/26 Deposition of carbon only since 1985 IPC+CPC Available in IPC and CPC
C23C 16/28 Deposition of only one other non-metal element since 1985 IPC+CPC Available in IPC and CPC
C23C 16/30 Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides since 1985 +3 CPC IPC+CPC Available in IPC and CPC