Skip to content
PCE
Search Classifications
Search for IPC and CPC classification codes or keywords
DIFF Subgroup
G03F 1/24

Reflection masks; Preparation thereof

Introduced: January 2012

Full Title

Full titles differ between systems:

IPC:

Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof > Reflection masks; Preparation thereof

CPC:

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof > Reflection masks; Preparation thereof

No child classifications to compare. This is a leaf node in both IPC and CPC.