Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Introduced: September 1968

Title

Titles differ between systems:

IPC: Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

CPC: Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Full Title

Full titles differ between systems:

IPC:

Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

CPC:

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

IPC and CPC are identically structured here. All 15 subcodes exist in both systems.

6 shared codes have differing titles between IPC and CPC.

IPC defines codes here since 2012.

Child Classifications

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G03F 1/20 Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof since 2012 IPC+CPC Available in IPC and CPC
G03F 1/22 Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof since 2012 IPC+CPC Available in IPC and CPC
G03F 1/26 Phase shift masks [PSM]; PSM blanks; Preparation thereof since 2012 IPC+CPC Available in IPC and CPC
G03F 1/36 Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes since 2012 IPC+CPC Available in IPC and CPC
G03F 1/38 Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof since 2012 IPC+CPC Available in IPC and CPC
G03F 1/50 Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof since 2012 IPC+CPC Available in IPC and CPC
G03F 1/52 Reflectors since 2012 IPC+CPC Available in IPC and CPC
G03F 1/54 Absorbers, e.g. of opaque materials since 2012 IPC+CPC Available in IPC and CPC
G03F 1/60 Substrates since 2012 IPC+CPC Available in IPC and CPC
G03F 1/62 Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof since 2012 IPC+CPC Available in IPC and CPC
G03F 1/66 Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof since 2012 IPC+CPC Available in IPC and CPC
G03F 1/68 Preparation processes not covered by groups G03F1/20 - G03F1/50 since 2012 IPC+CPC Available in IPC and CPC
G03F 1/88 prepared by photographic processes for production of originals simulating relief since 2012 IPC+CPC Available in IPC and CPC
G03F 1/90 prepared by montage processes since 2012 IPC+CPC Available in IPC and CPC
G03F 1/92 prepared from printing surfaces since 2012 IPC+CPC Available in IPC and CPC