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DIFF Main Group
G03F 1/00

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Introduced: September 1968

Title

Titles differ between systems:

IPC: Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

CPC: Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Full Title

Full titles differ between systems:

IPC:

Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

CPC:

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

IPC and CPC are identically structured here. All 15 subcodes exist in both systems.

6 shared codes have differing titles between IPC and CPC.

IPC defines codes here since 2012.

Child Classifications

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  • G03F 1/20 Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof since 2012 IPC+CPC Available in IPC and CPC
  • G03F 1/36 Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes since 2012 IPC+CPC Available in IPC and CPC
  • G03F 1/50 Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof since 2012 IPC+CPC Available in IPC and CPC
  • G03F 1/52 Reflectors since 2012 IPC+CPC Available in IPC and CPC
  • G03F 1/60 Substrates since 2012 IPC+CPC Available in IPC and CPC
  • G03F 1/66 Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof since 2012 IPC+CPC Available in IPC and CPC
  • G03F 1/88 prepared by photographic processes for production of originals simulating relief since 2012 IPC+CPC Available in IPC and CPC
  • G03F 1/90 prepared by montage processes since 2012 IPC+CPC Available in IPC and CPC
  • G03F 1/92 prepared from printing surfaces since 2012 IPC+CPC Available in IPC and CPC

Top Applicants

Top Applicants (IPC)

Class G03,2013–2023, worldwide · Source: EPO PATSTAT

  1. CANON 31,416
  2. CANON JP 17,469
  3. KYOCERA DOCUMENT SOLUTIONS 9,845
  4. RICOH COMPANY 9,807
  5. ASML NETHERLANDS NL 9,427
  6. FUJIFILM JP 7,225
  7. KONICA MINOLTA CORPORATION 7,216
  8. FUJI XEROX COMPANY 5,711
  9. CARL ZEISS SMT DE 4,971
  10. RICOH COMPANY JP 4,123

Top Applicants (CPC)

Class G03,2013–2023, worldwide · Source: EPO PATSTAT

  1. CANON JP 19,215
  2. CANON 12,916
  3. ASML NETHERLANDS NL 10,000
  4. FUJIFILM JP 7,814
  5. SAMSUNG ELECTRONICS COMPANY KR 5,181
  6. CARL ZEISS SMT DE 5,079
  7. RICOH COMPANY JP 4,343
  8. LG INNOTEK COMPANY KR 4,054
  9. KYOCERA DOCUMENT SOLUTIONS 3,812
  10. KYOCERA DOCUMENT SOLUTIONS JP 3,682