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PCE
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DIFF Subgroup
G03F 1/29

Rim PSM or outrigger PSM; Preparation thereof

Introduced: January 2012

Full Title

Full titles differ between systems:

IPC:

Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Phase shift masks [PSM]; PSM blanks; Preparation thereof > Rim PSM or outrigger PSM; Preparation thereof

CPC:

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Phase shift masks [PSM]; PSM blanks; Preparation thereof > Rim PSM or outrigger PSM; Preparation thereof

No child classifications to compare. This is a leaf node in both IPC and CPC.

Top Applicants

Top Applicants (IPC)

Class G03,2013–2023, worldwide · Source: EPO PATSTAT

  1. CANON 31,416
  2. CANON JP 17,469
  3. KYOCERA DOCUMENT SOLUTIONS 9,845
  4. RICOH COMPANY 9,807
  5. ASML NETHERLANDS NL 9,427
  6. FUJIFILM JP 7,225
  7. KONICA MINOLTA CORPORATION 7,216
  8. FUJI XEROX COMPANY 5,711
  9. CARL ZEISS SMT DE 4,971
  10. RICOH COMPANY JP 4,123

Top Applicants (CPC)

Class G03,2013–2023, worldwide · Source: EPO PATSTAT

  1. CANON JP 19,215
  2. CANON 12,916
  3. ASML NETHERLANDS NL 10,000
  4. FUJIFILM JP 7,814
  5. SAMSUNG ELECTRONICS COMPANY KR 5,181
  6. CARL ZEISS SMT DE 5,079
  7. RICOH COMPANY JP 4,343
  8. LG INNOTEK COMPANY KR 4,054
  9. KYOCERA DOCUMENT SOLUTIONS 3,812
  10. KYOCERA DOCUMENT SOLUTIONS JP 3,682