Phase shift masks [PSM]; PSM blanks; Preparation thereof

Introduced: January 2012

Full Title

Full titles differ between systems:

IPC:

Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Phase shift masks [PSM]; PSM blanks; Preparation thereof

CPC:

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Phase shift masks [PSM]; PSM blanks; Preparation thereof

IPC and CPC are identically structured here. All 5 subcodes exist in both systems.

1 shared codes have differing titles between IPC and CPC.

IPC defines codes here since 2012.

Child Classifications

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G03F 1/28 with three or more diverse phases on the same PSM; Preparation thereof since 2012 IPC+CPC Available in IPC and CPC
G03F 1/29 Rim PSM or outrigger PSM; Preparation thereof since 2012 IPC+CPC Available in IPC and CPC
G03F 1/30 Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof since 2012 IPC+CPC Available in IPC and CPC
G03F 1/32 Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion,; Preparation thereof since 2012 IPC+CPC Available in IPC and CPC
G03F 1/34 Phase-edge PSM, e.g. chromeless PSM; Preparation thereof since 2012 IPC+CPC Available in IPC and CPC