Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Introduced: January 2012

Title

Titles differ between systems:

IPC: Mask blanks not covered by groups; Preparation thereof

CPC: Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Full Title

Full titles differ between systems:

IPC:

Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Mask blanks not covered by groups; Preparation thereof

CPC:

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

No child classifications to compare. This is a leaf node in both IPC and CPC.