G03F 1/38 Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
Introduced: January 2012
Full Title
Full titles differ between systems:
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
IPC and CPC are identically structured here. All 5 subcodes exist in both systems.
IPC defines codes here since 2012.
Child Classifications
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- G03F 1/40 Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate since 2012 IPC+CPC Available in IPC and CPC
- G03F 1/42 Alignment or registration features, e.g. alignment marks on the mask substrates since 2012 IPC+CPC Available in IPC and CPC
- G03F 1/44 Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales since 2012 IPC+CPC Available in IPC and CPC