Organic absorbers, e.g. of photo-resists

Introduced: January 2012

Title

Titles differ between systems:

IPC: Organic absorbers, e.g. photo-resists

CPC: Organic absorbers, e.g. of photo-resists

Full Title

Full titles differ between systems:

IPC:

Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Absorbers, e.g. opaque materials > Organic absorbers, e.g. photo-resists

CPC:

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Absorbers, e.g. of opaque materials > Organic absorbers, e.g. of photo-resists

No child classifications to compare. This is a leaf node in both IPC and CPC.