having two or more different absorber layers, e.g. stacked multilayer absorbers

Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Absorbers, e.g. opaque materials > having two or more different absorber layers, e.g. stacked multilayer absorbers

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Absorbers, e.g. of opaque materials > having two or more different absorber layers, e.g. stacked multilayer absorbers