with photosensitivity-increasing substances, e.g. photoinitiators

Introduced: January 1990

Full Title

Full titles differ between systems:

IPC:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor > Photosensitive materials > Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds > with photosensitivity-increasing substances, e.g. photoinitiators

CPC:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K) > Photosensitive materials (G03F7/12, G03F7/14 take precedence) > Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F7/075 takes precedence) > with photosensitivity-increasing substances, e.g. photoinitiators

Of 3 combined children, 2 exist in both systems.

1 codes are CPC-only extensions.

1 shared codes have differing titles between IPC and CPC.

IPC defines codes here since 1990.

Child Classifications

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G03F 7/0285 CPC only CPC only
G03F 7/029 Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur since 1990 +1 CPC IPC+CPC Available in IPC and CPC
G03F 7/031 Organic compounds not covered by group G03F7/029 since 1990 IPC+CPC Available in IPC and CPC