G03F 7/004 Photosensitive materials (G03F7/12, G03F7/14 take precedence)
Introduced: January 1990
Title
Titles differ between systems:
IPC: Photosensitive materials
CPC: Photosensitive materials (G03F7/12, G03F7/14 take precedence)
Full Title
Full titles differ between systems:
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor > Photosensitive materials
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K) > Photosensitive materials (G03F7/12, G03F7/14 take precedence)
Of 18 combined children, 12 exist in both systems.
6 codes are CPC-only extensions.
11 shared codes have differing titles between IPC and CPC.
Child Classifications
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- G03F 7/016 Diazonium salts or compounds (G03F7/075 takes precedence) since 1990 +2 CPC IPC+CPC Available in IPC and CPC
- G03F 7/022 Quinonediazides (G03F7/075 takes precedence) since 1990 +2 CPC IPC+CPC Available in IPC and CPC
- G03F 7/025 Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds (G03F7/075 takes precedence) since 1990 IPC+CPC Available in IPC and CPC
- G03F 7/027 Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F7/075 takes precedence) since 1990 +1 CPC IPC+CPC Available in IPC and CPC
- G03F 7/038 Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) since 1990 +6 CPC IPC+CPC Available in IPC and CPC
- G03F 7/039 Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F7/075 takes precedence; macromolecular quinonediazides G03F7/023) since 1990 +1 CPC IPC+CPC Available in IPC and CPC
- G03F 7/085 Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives (G03F7/075 takes precedence) since 1990 IPC+CPC Available in IPC and CPC
- G03F 7/09 characterised by structural details, e.g. supports, auxiliary layers (supports for printing plates in general B41N) since 1990 +4 CPC IPC+CPC Available in IPC and CPC
Top Applicants
Top Applicants (IPC)
Class G03,2013–2023, worldwide · Source: EPO PATSTAT
- CANON 31,416
- CANON JP 17,469
- KYOCERA DOCUMENT SOLUTIONS 9,845
- RICOH COMPANY 9,807
- ASML NETHERLANDS NL 9,427
- FUJIFILM JP 7,225
- KONICA MINOLTA CORPORATION 7,216
- FUJI XEROX COMPANY 5,711
- CARL ZEISS SMT DE 4,971
- RICOH COMPANY JP 4,123
Top Applicants (CPC)
Class G03,2013–2023, worldwide · Source: EPO PATSTAT
- CANON JP 19,215
- CANON 12,916
- ASML NETHERLANDS NL 10,000
- FUJIFILM JP 7,814
- SAMSUNG ELECTRONICS COMPANY KR 5,181
- CARL ZEISS SMT DE 5,079
- RICOH COMPANY JP 4,343
- LG INNOTEK COMPANY KR 4,054
- KYOCERA DOCUMENT SOLUTIONS 3,812
- KYOCERA DOCUMENT SOLUTIONS JP 3,682