Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F7/075 takes precedence; macromolecular quinonediazides G03F7/023)

Introduced: January 1990

Title

Titles differ between systems:

IPC: Macromolecular compounds which are photodegradable, e.g. positive electron resists

CPC: Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F7/075 takes precedence; macromolecular quinonediazides G03F7/023)

Full Title

Full titles differ between systems:

IPC:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor > Photosensitive materials > Macromolecular compounds which are photodegradable, e.g. positive electron resists

CPC:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K) > Photosensitive materials (G03F7/12, G03F7/14 take precedence) > Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F7/075 takes precedence; macromolecular quinonediazides G03F7/023)

Of 1 combined children, 0 exist in both systems.

1 codes are CPC-only extensions.

Child Classifications

Navigate with arrow keys, Enter to open

G03F 7/0392 +2 CPC CPC only CPC only