Phase shift masks [PSM]; PSM blanks; Preparation thereof

Full Title

Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Phase shift masks [PSM]; PSM blanks; Preparation thereof

Classification Context

Section:

PHYSICS

Class:

PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY

Subclass:

PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR

Child Classifications

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• G03F 1/28 with three or more diverse phases on the same PSM; Preparation thereof
• G03F 1/29 Rim PSM or outrigger PSM; Preparation thereof
• G03F 1/3 Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof
• G03F 1/32 Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
• G03F 1/34 Phase-edge PSM, e.g. chromeless PSM; Preparation thereof