PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR

Introduced: September 1968

Classification Context

Section:: PHYSICS
Class:: PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
Subclass:: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR

Description

G03F encompasses photomechanical and photolithographic processes for creating textured or patterned surfaces on substrates, with primary applications in printing plate production and semiconductor device manufacturing. The classification covers photoresists and light-sensitive materials, exposure techniques, development processes, and specialized apparatus used in pattern transfer. It includes origination materials (photographic originals, masks, and reticles) and substrates for pattern creation. Adjacent classes exclude general photographic processes (G03C), electrography (G03G), and the subsequent etching or ion-beam processing steps that follow pattern definition.

Related Keywords

PHOTO -mechanical production of textured or patterned surfacesPHOTO sensitive materials for photomechanical production of textured or patterned surfacesPHOTORESIST(S)photomechanical or phototype production of printing PLATE(S)photomechanical or phototype processes for producing PRINTING -surfacesphoto-mechanical REPRODUCTION

5 direct subcodes

Child Classifications

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G03F 1/00 Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
G03F 3/00 Colour separation; Correction of tonal value
G03F 5/00 Screening processes; Screens therefor
G03F 7/00 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F 9/00 Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically