IPC Subgroup
G03F 7/4 Treatment after imagewise removal, e.g. baking
Introduced: January 1990
Last revised: January 2006
Full Title
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor > Processing photosensitive materials; Apparatus therefor > Treatment after imagewise removal, e.g. baking
Classification Context
- Section:
- PHYSICS
- Class:
- PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- Subclass:
- PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR