IPC Main Group
G03F 7/00 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Introduced: September 1968
Last revised: January 2006
Classification Context
- Section:
- PHYSICS
- Class:
- PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- Subclass:
- PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
Related Keywords
processes for the photomechanical production of textured or patterned surfaces for PHOTOGRAVURE
6 direct subcodes
Child Classifications
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- G03F 7/004 Photosensitive materials
- G03F 7/12 Production of screen printing forms or similar printing forms, e.g. stencils
- G03F 7/14 Production of collotype printing forms
- G03F 7/16 Coating processes; Apparatus therefor
- G03F 7/2 Exposure; Apparatus therefor
- G03F 7/26 Processing photosensitive materials; Apparatus therefor