Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Classification Context

Section:

PHYSICS

Class:

PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY

Subclass:

PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR

Related Keywords

Child Classifications

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• G03F 7/004 Photosensitive materials
• G03F 7/12 Production of screen printing forms or similar printing forms, e.g. stencils
• G03F 7/14 Production of collotype printing forms
• G03F 7/16 Coating processes; Apparatus therefor
• G03F 7/2 Exposure; Apparatus therefor
• G03F 7/26 Processing photosensitive materials; Apparatus therefor