Processing photosensitive materials; Apparatus therefor

Introduced: January 1980

Last revised: January 2006

Full Title

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor > Processing photosensitive materials; Apparatus therefor

Classification Context

Section:: PHYSICS
Class:: PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
Subclass:: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR

7 direct subcodes

Child Classifications

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G03F 7/28 for obtaining powder images
G03F 7/3 Imagewise removal using liquid means
G03F 7/34 Imagewise removal by selective transfer, e.g. peeling away
G03F 7/36 Imagewise removal not covered by groups , e.g. using gas streams, using plasma
G03F 7/38 Treatment before imagewise removal, e.g. prebaking
G03F 7/4 Treatment after imagewise removal, e.g. baking
G03F 7/42 Stripping or agents therefor