Processing photosensitive materials; Apparatus therefor

Full Title

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor > Processing photosensitive materials; Apparatus therefor

Classification Context

Section:

PHYSICS

Class:

PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY

Subclass:

PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR

Child Classifications

Navigate with arrow keys, Enter to open

• G03F 7/28 for obtaining powder images
• G03F 7/3 Imagewise removal using liquid means
• G03F 7/34 Imagewise removal by selective transfer, e.g. peeling away
• G03F 7/36 Imagewise removal not covered by groups , e.g. using gas streams, using plasma
• G03F 7/38 Treatment before imagewise removal, e.g. prebaking
• G03F 7/4 Treatment after imagewise removal, e.g. baking
• G03F 7/42 Stripping or agents therefor