IPC Subgroup
H10P 52/2 Electromechanical polishing [EMP]; Electrochemical mechanical polishing [ECMP]
Introduced: January 2026
Full Title
Grinding, lapping or polishing of wafers, substrates or parts of devices > Electromechanical polishing [EMP]; Electrochemical mechanical polishing [ECMP]
Classification Context
- Section:
- ELECTRICITY
- Class:
- SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- Subclass:
- GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS