characterised by the deposition of inorganic material, other than metallic material

Full Title

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes (reactive sputtering or vacuum evaporation C23C14/00) > characterised by the deposition of inorganic material, other than metallic material

Child Classifications

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• C23C 16/24 Deposition of silicon only
• C23C 16/26 Deposition of carbon only
• C23C 16/28 Deposition of only one other non-metal element
• C23C 16/30 Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides