Alignment or registration features, e.g. alignment marks on the mask substrates

Full Title

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof > Alignment or registration features, e.g. alignment marks on the mask substrates