CPC Subgroup
G03F 1/38 Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
Full Title
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
5 direct subcodes
Child Classifications
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- G03F 1/40 Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate
- G03F 1/42 Alignment or registration features, e.g. alignment marks on the mask substrates
- G03F 1/44 Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales
- G03F 1/46 Antireflective coatings
- G03F 1/48 Protective coatings
Top Applicants
Top 10 applicants by patent filingsfor class G03, 2013–2023, worldwide · Source: EPO PATSTAT
- CANON JP 19,215
- CANON 12,916
- ASML NETHERLANDS NL 10,000
- FUJIFILM JP 7,814
- SAMSUNG ELECTRONICS COMPANY KR 5,181
- CARL ZEISS SMT DE 5,079
- RICOH COMPANY JP 4,343
- LG INNOTEK COMPANY KR 4,054
- KYOCERA DOCUMENT SOLUTIONS 3,812
- KYOCERA DOCUMENT SOLUTIONS JP 3,682