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CPC Subgroup
G03F 1/38

Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof

Full Title

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof

5 direct subcodes

Child Classifications

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  • G03F 1/40 Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate
  • G03F 1/42 Alignment or registration features, e.g. alignment marks on the mask substrates
  • G03F 1/44 Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales
  • G03F 1/46 Antireflective coatings
  • G03F 1/48 Protective coatings

Top Applicants

Top 10 applicants by patent filingsfor class G03, 2013–2023, worldwide · Source: EPO PATSTAT

  1. CANON JP 19,215
  2. CANON 12,916
  3. ASML NETHERLANDS NL 10,000
  4. FUJIFILM JP 7,814
  5. SAMSUNG ELECTRONICS COMPANY KR 5,181
  6. CARL ZEISS SMT DE 5,079
  7. RICOH COMPANY JP 4,343
  8. LG INNOTEK COMPANY KR 4,054
  9. KYOCERA DOCUMENT SOLUTIONS 3,812
  10. KYOCERA DOCUMENT SOLUTIONS JP 3,682