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PCE
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CPC Subgroup
G03F 1/44

Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales

Full Title

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof > Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales