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PCE
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CPC Subgroup
G03F 1/50

Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Full Title

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof