Patterning of masks by imaging

Full Title

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Preparation processes not covered by groups G03F1/20 - G03F1/50 > Patterning of masks by imaging

Child Classifications

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• G03F 1/78 by charged particle beam [CPB], e.g. electron beam patterning of masks