CPC Subgroup
G03F 7/022 Quinonediazides (G03F7/075 takes precedence)
Full Title
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K) > Photosensitive materials (G03F7/12, G03F7/14 take precedence) > Quinonediazides (G03F7/075 takes precedence)
3 direct subcodes
Child Classifications
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- G03F 7/023 Macromolecular quinonediazides; Macromolecular additives, e.g. binders
Top Applicants
Top 10 applicants by patent filingsfor class G03, 2013–2023, worldwide · Source: EPO PATSTAT
- CANON JP 19,215
- CANON 12,916
- ASML NETHERLANDS NL 10,000
- FUJIFILM JP 7,814
- SAMSUNG ELECTRONICS COMPANY KR 5,181
- CARL ZEISS SMT DE 5,079
- RICOH COMPANY JP 4,343
- LG INNOTEK COMPANY KR 4,054
- KYOCERA DOCUMENT SOLUTIONS 3,812
- KYOCERA DOCUMENT SOLUTIONS JP 3,682