G03F 7/022 Quinonediazides (G03F7/075 takes precedence)
Introduced: January 1990
Title
Titles differ between systems:
IPC: Quinonediazides
CPC: Quinonediazides (G03F7/075 takes precedence)
Full Title
Full titles differ between systems:
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor > Photosensitive materials > Quinonediazides
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K) > Photosensitive materials (G03F7/12, G03F7/14 take precedence) > Quinonediazides (G03F7/075 takes precedence)
CPC subdivides this area 3x more granularly than IPC with 2 additional codes.
2 codes are CPC-only extensions.
IPC defines codes here since 1990.
Child Classifications
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- G03F 7/023 Macromolecular quinonediazides; Macromolecular additives, e.g. binders since 1990 +1 CPC IPC+CPC Available in IPC and CPC