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CPC Subgroup
G03F 7/26

Processing photosensitive materials; Apparatus therefor (G03F7/12 - G03F7/24 take precedence)

Full Title

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K) > Processing photosensitive materials; Apparatus therefor (G03F7/12 - G03F7/24 take precedence)

8 direct subcodes

Child Classifications

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  • G03F 7/28 for obtaining powder images (G03F3/10 takes precedence)
  • G03F 7/36 Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
  • G03F 7/38 Treatment before imagewise removal, e.g. prebaking

Top Applicants

Top 10 applicants by patent filingsfor class G03, 2013–2023, worldwide · Source: EPO PATSTAT

  1. CANON JP 19,215
  2. CANON 12,916
  3. ASML NETHERLANDS NL 10,000
  4. FUJIFILM JP 7,814
  5. SAMSUNG ELECTRONICS COMPANY KR 5,181
  6. CARL ZEISS SMT DE 5,079
  7. RICOH COMPANY JP 4,343
  8. LG INNOTEK COMPANY KR 4,054
  9. KYOCERA DOCUMENT SOLUTIONS 3,812
  10. KYOCERA DOCUMENT SOLUTIONS JP 3,682