CPC Subgroup
H10D 84/02 characterised by using material-based technologies
Full Title
Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers > Manufacture or treatment > characterised by using material-based technologies
4 direct subcodes
Child Classifications
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- H10D 84/03 using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
- H10D 84/05 using Group III-V technology
- H10D 84/07 using Group II-VI technology
- H10D 84/08 using combinations of technologies, e.g. using both Si and SiC technologies or using both Si and Group III-V technologies