CPC Main Group
H10P 54/00 Cutting or separating of wafers, substrates or parts of devices
5 direct subcodes
Child Classifications
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- H10P 54/20 by laser cutting
- H10P 54/30 by forming weakened zones for subsequent cutting or separating, e.g. by laser treatment or by ion implantation
- H10P 54/40 by sawing, e.g. using revolving or reciprocating blades
- H10P 54/50 by scoring, breaking or cleaving
- H10P 54/90 Auxiliary processes or arrangements
Top Applicants
Top 10 applicants by patent filingsfor class H10, 2013–2023, worldwide · Source: EPO PATSTAT
- SAMSUNG DISPLAY KR 38,446
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY TW 30,922
- SAMSUNG ELECTRONICS COMPANY KR 30,059
- BOE TECHNOLOGY GROUP COMPANY CN 20,304
- LG DISPLAY COMPANY KR 17,772
- BOE TECHNOLOGY GROUP COMPANY 15,621
- SEMICONDUCTOR ENERGY LABORATORY COMPANY JP 13,629
- IBM (INTERNATIONAL BUSINESS MACHINES CORPORATION) US 11,750
- SAMSUNG DISPLAY 11,316
- SEMICONDUCTOR ENERGY LABORATORY COMPANY 9,697