characterised by the deposition of inorganic material, other than metallic material

Introduced: January 1985

Last revised: January 2006

Full Title

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes > characterised by the deposition of inorganic material, other than metallic material

Classification Context

Section:: CHEMISTRY; METALLURGY
Class:: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
Subclass:: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL

4 direct subcodes

Child Classifications

Navigate with arrow keys, Enter to open

C23C 16/24 Deposition of silicon only
C23C 16/26 Deposition of carbon only
C23C 16/28 Deposition of only one other non-metal element
C23C 16/3 Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides