Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes

Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes