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PCE
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DIFF Subgroup
G03F 1/78

by charged particle beam [CPB], e.g. electron beam patterning of masks

Introduced: January 2012

Title

Titles differ between systems:

IPC: by charged particle beam [CPB], e.g. electron beam

CPC: by charged particle beam [CPB], e.g. electron beam patterning of masks

Full Title

Full titles differ between systems:

IPC:

Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Preparation processes not covered by groups > Patterning of masks by imaging > by charged particle beam [CPB], e.g. electron beam

CPC:

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Preparation processes not covered by groups G03F1/20 - G03F1/50 > Patterning of masks by imaging > by charged particle beam [CPB], e.g. electron beam patterning of masks

No child classifications to compare. This is a leaf node in both IPC and CPC.