Preparation processes not covered by groups G03F1/20 - G03F1/50

Introduced: January 2012

Title

Titles differ between systems:

IPC: Preparation processes not covered by groups

CPC: Preparation processes not covered by groups G03F1/20 - G03F1/50

Full Title

Full titles differ between systems:

IPC:

Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Preparation processes not covered by groups

CPC:

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Preparation processes not covered by groups G03F1/20 - G03F1/50

IPC and CPC are identically structured here. All 5 subcodes exist in both systems.

2 shared codes have differing titles between IPC and CPC.

IPC defines codes here since 2012.

Child Classifications

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G03F 1/70 Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging since 2012 IPC+CPC Available in IPC and CPC
G03F 1/72 Repair or correction of mask defects since 2012 IPC+CPC Available in IPC and CPC
G03F 1/76 Patterning of masks by imaging since 2012 IPC+CPC Available in IPC and CPC
G03F 1/80 Etching since 2012 IPC+CPC Available in IPC and CPC
G03F 1/82 Auxiliary processes, e.g. cleaning or inspecting since 2012 IPC+CPC Available in IPC and CPC