IPC Main Group
C23C 16/00 Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
Introduced: January 1985
Last revised: January 2006
Classification Context
- Section:
- CHEMISTRY; METALLURGY
- Class:
- COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- Subclass:
- COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
Related Keywords
CHEMICAL(S) vapour deposition methods (CVD)COATING with metals by vapour depositionCVD [= chemical vapour deposition]vapour deposition of metalsGAS-PLATINGgas-plating of METAL(S)
7 direct subcodes
Child Classifications
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- C23C 16/01 on temporary substrates, e.g. on substrates subsequently removed by etching
- C23C 16/02 Pretreatment of the material to be coated
- C23C 16/04 Coating on selected surface areas, e.g. using masks
- C23C 16/06 characterised by the deposition of metallic material
- C23C 16/22 characterised by the deposition of inorganic material, other than metallic material
- C23C 16/44 characterised by the method of coating
- C23C 16/56 After-treatment
Top Applicants
Top 10 applicants by patent filingsfor class C23, 2013–2023, worldwide · Source: EPO PATSTAT
- APPLIED MATERIALS US 8,096
- TOKYO ELECTRON JP 3,985
- CHINESE ACADEMY OF SCIENCES 2,842
- LAM RESEARCH CORPORATION US 2,654
- TOKYO ELECTRON 2,540
- NIPPON STEEL CORPORATION JP 2,465
- JFE STEEL JP 2,368
- ASM IP HOLDING NL 2,092
- APPLIED MATERIALS 1,877
- POSCO (POHANG IRON AND STEEL COMPANY) KR 1,782