Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof

Full Title

Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof

Classification Context

Section:

PHYSICS

Class:

PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY

Subclass:

PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR

Child Classifications

Navigate with arrow keys, Enter to open

• G03F 1/4 Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate
• G03F 1/42 Alignment or registration features, e.g. alignment marks on the mask substrates
• G03F 1/44 Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales
• G03F 1/46 Antireflective coatings
• G03F 1/48 Protective coatings