Preparation processes not covered by groups

Full Title

Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Preparation processes not covered by groups

Classification Context

Section:

PHYSICS

Class:

PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY

Subclass:

PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR

Child Classifications

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• G03F 1/7 Adapting basic layout or design of masks to lithographic process requirements, e.g. second iteration correction of mask patterns for imaging
• G03F 1/72 Repair or correction of mask defects
• G03F 1/76 Patterning of masks by imaging
• G03F 1/8 Etching
• G03F 1/82 Auxiliary processes, e.g. cleaning