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IPC Subgroup
G03F 7/031

Organic compounds not covered by group

Introduced: January 1990

Last revised: January 2006

Full Title

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor > Photosensitive materials > Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds > with photosensitivity-increasing substances, e.g. photoinitiators > Organic compounds not covered by group

Classification Context

Section:
PHYSICS
Class:
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
Subclass:
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR

Top Applicants

Top 10 applicants by patent filingsfor class G03, 2013–2023, worldwide · Source: EPO PATSTAT

  1. CANON 31,416
  2. CANON JP 17,469
  3. KYOCERA DOCUMENT SOLUTIONS 9,845
  4. RICOH COMPANY 9,807
  5. ASML NETHERLANDS NL 9,427
  6. FUJIFILM JP 7,225
  7. KONICA MINOLTA CORPORATION 7,216
  8. FUJI XEROX COMPANY 5,711
  9. CARL ZEISS SMT DE 4,971
  10. RICOH COMPANY JP 4,123