Photosensitive materials

Full Title

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor > Photosensitive materials

Classification Context

Section:

PHYSICS

Class:

PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY

Subclass:

PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR

Child Classifications

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• G03F 7/008 Azides
• G03F 7/016 Diazonium salts or compounds
• G03F 7/022 Quinonediazides
• G03F 7/025 Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
• G03F 7/027 Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
• G03F 7/038 Macromolecular compounds which are rendered insoluble or differentially wettable
• G03F 7/039 Macromolecular compounds which are photodegradable, e.g. positive electron resists
• G03F 7/04 Chromates
• G03F 7/06 Silver salts
• G03F 7/075 Silicon-containing compounds
• G03F 7/085 Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
• G03F 7/09 characterised by structural details, e.g. supports, auxiliary layers