Exposure; Apparatus therefor

Introduced: September 1968

Last revised: January 2006

Full Title

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor > Exposure; Apparatus therefor

Classification Context

Section:: PHYSICS
Class:: PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
Subclass:: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR

4 direct subcodes

Child Classifications

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G03F 7/207 Means for focusing, e.g. automatically
G03F 7/213 Exposing with the same light pattern different positions of the same surface at the same time
G03F 7/22 Exposing sequentially with the same light pattern different positions of the same surface
G03F 7/24 Curved surfaces