Dry etching; Plasma etching; Reactive-ion etching

Full Title

Etching of wafers, substrates or parts of devices > Dry etching; Plasma etching; Reactive-ion etching

Classification Context

Section:

ELECTRICITY

Class:

SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR

Subclass:

GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS

Child Classifications

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• H10P 50/24 of semiconductor materials
• H10P 50/26 of conductive or resistive materials
• H10P 50/28 of insulating materials