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PCE
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DIFF Subgroup
G03F 1/72

Repair or correction of mask defects

Introduced: January 2012

Full Title

Full titles differ between systems:

IPC:

Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Preparation processes not covered by groups > Repair or correction of mask defects

CPC:

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Preparation processes not covered by groups G03F1/20 - G03F1/50 > Repair or correction of mask defects

IPC and CPC are identically structured here. All 1 subcodes exist in both systems.

IPC defines codes here since 2012.

Child Classifications

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  • G03F 1/74 by charged particle beam [CPB], e.g. focused ion beam since 2012 IPC+CPC Available in IPC and CPC