DIFF Subgroup
G03F 1/80 Etching
Introduced: January 2012
Full Title
Full titles differ between systems:
IPC:
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Preparation processes not covered by groups > Etching
CPC:
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof > Preparation processes not covered by groups G03F1/20 - G03F1/50 > Etching
No child classifications to compare. This is a leaf node in both IPC and CPC.